Operando Study of Thermal Oxidation of Monolayer MoS2

Sangwook Park, Angel T. Garcia-Esparza, Hadi Abroshan, Baxter Abraham, John Vinson, Alessandro Gallo, Dennis Nordlund, Joonsuk Park, Taeho Roy Kim, Lauren Vallez, Roberto Alonso-Mori, Dimosthenis Sokaras, Xiaolin Zheng
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Advanced Science

Monolayer MoS2 is a promising semiconductor to overcome the physical dimension limits of microelectronic devices. Understanding the thermochemical stability of MoS2 is essential since these devices generate heat and are susceptible to oxidative environments. Herein, the promoting effect of molybdenum oxides (MoOx) particles on the thermal oxidation of MoS2 monolayers is shown by employing operando X-ray absorptionspectroscopy, ex situ scanning electron microscopy and X-ray photoelectron spectroscopy. The study demonstrates that chemical vapor deposition-grown MoS2 monolayers contain intrinsic MoOx and are quickly oxidized at 100 °C (3 vol% O /He), in contrast to previously reported oxidation thresholds (e.g., 250 °C, t ≤ 1 h in the air). Otherwise, removing MoOx increases the thermal oxidation onset temperature of monolayer MoS2 to 300 °C. These results indicate that MoOx promote oxidation. An oxide-free lattice is critical to the long-term stability of monolayer MoS2 in state-of-the-art 2D electronic, optical, and catalytic applications.

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